Author Info
Name
Affiliation
Papers
KOJI NAGATOMO
Semiconductor and Storage Products Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
1
Collaborators
Citations 
PageRank 
8
0
0.34
Referers 
Referees 
References 
0
0
0
Title
Citations
PageRank
Year
Time-dependent dielectric breakdown (TDDB) distribution in n-MOSFET with HfSiON gate dielectrics under DC and AC stressing.00.342013