Paper Info
Title
Fabrication of the multi-PCR chamber with inner heat-sink materials using a micro-blaster etching technique
Abstract
In this paper, we propose a new design for a PCR (polymerase chain reaction) chamber with a temperature sensor under a top glass wafer and heaters on the bottom glass wafer. These chamber sensors are thermally isolated from the heater. The multi PCR chamber has an inner heat-sink material of etched silicon mass or glass mass using a micro-blaster. Then we will capture the image of the thermal mass temperature profile among the chambers by using the TIS (thermal imaging system). The performance of the inner heat-sink materials is analyzed during the PCR cycles and the thermal interference of the chamber, respectively.
Year
DOI
Venue
2005
10.1109/ICMENS.2005.49
ICMENS
Keywords
Field
DocType
chemical reactors,micro-blaster etching technique,chamber sensors,temperature sensors,thermal mass temperature profile,multi-pcr chamber,glass mass,bottom glass wafers,multipolymerase chain reaction chamber fabrication,etched silicon mass,microblaster etching technique,infrared imaging,inner heat-sink materials,microblaster,polymers,etched glass mass,thermal imaging system,top glass wafer,heat sinks,chamber sensor,inner heat-sink material,bottom glass wafer,si,pcr cycle,etching,multi pcr chamber,temperature sensor,heaters,top glass wafers,resists,silicon,fabrication,lamination,glass
Lamination,Wafer,Analytical chemistry,Etching,Wafer bonding,Thermal mass,Electronic engineering,Heat sink,Engineering,Optoelectronics,Silicon,Fabrication
Conference
ISBN
Citations 
PageRank 
0-7695-2398-6
0
0.34
References 
Authors
0
6
Name
Order
Citations
PageRank
Hyoung-Jin Park100.34
Duk-Soo Eun200.34
Dae-Young Kong300.34
Seong-Jin Kong400.34
Seong-Ho Kong511.79
Jong-Hyun Lee64410.32