Abstract | ||
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This paper describes a measurement system for the electrical characterization of oxide thin films. Such films can be produced using plasma-sputtering processes and permit the realization of a large set of high-performance components, such as capacitors, active devices, sensors, and protective coatings. The electrical properties of the oxide films, which have a thickness of less than 1 mu m, are difficult to measure since very high resistances (on the order of gigaohms) and small capacitances (on the order of picofarads) are expected for contact areas smaller than 1 mm(2). The measurement system and the procedures described in this paper represent an alternative solution to the commercial devices, which usually employ a mercury probe for performing the contact with the specimen under characterization. Furthermore, the proposed system can be used not only to estimate the electrical properties of a single point but to evaluate the uniformity of oxide films on large specimens as well. The experimental results reported refer to valve-metal-based oxide films deposited in a lab-scale capacitively coupled parallel-plate reactor and show the effectiveness of the proposed procedures. |
Year | DOI | Venue |
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2009 | 10.1109/TIM.2008.2009035 | IEEE T. Instrumentation and Measurement |
Keywords | Field | DocType |
aluminium compounds,niobium compounds,permittivity,plasma materials processing,protective coatings,sputter deposition,sputtered coatings,zirconium compounds,Al2O3,Nb2O5,ZrO2,capacitively coupled parallel-plate reactor,capacitors,electrical characterization,oxide thin films,permittivity,plasma-sputtering processes,protective coatings,sensors,Electric variable measurement,permittivity measurement,plasma applications,thickness measurement,thin films | Capacitor,Oxide,System of measurement,Sputter deposition,Electronic engineering,Capacitive sensing,Mercury probe,Thin film,Transistor,Optoelectronics,Mathematics | Journal |
Volume | Issue | ISSN |
58 | 5 | 0018-9456 |
Citations | PageRank | References |
2 | 0.54 | 0 |
Authors | ||
3 |
Name | Order | Citations | PageRank |
---|---|---|---|
Alessio Carullo | 1 | 73 | 17.56 |
Sabrina Grassini | 2 | 37 | 17.96 |
Marco Parvis | 3 | 96 | 28.85 |