Name
Abstract | ||
|---|---|---|
Atom lithography is one of the latest proposals for high-resolution printing. The mask design and generation is key step for implementation of this method. In this paper, we have theoretically investigated and proposed a new method for two-dimensional optical mask design in atom lithography. A new method for realization of our proposed technique based on guided modes will present. With our proposed idea one can easily print every kind of two-dimensional patterns. This method can lead us to produce the nano-scale electronic and optical devices and systems. Also, a suitable algorithm for mask generation is proposed. |
Year | DOI | Venue |
|---|---|---|
2006 | 10.1016/j.mejo.2005.06.008 | Microelectronics Journal |
Keywords | Field | DocType |
Atom lithography,Gradient force,One-dimensional atomic lens,Two-dimensional optical mask,Nano-technology | Integrated circuit layout,Engineering physics,Nanoelectronics,Atom,Optics,Electronic engineering,Lithography,Pressure-gradient force,Engineering | Journal |
Volume | Issue | ISSN |
37 | 1 | 0026-2692 |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
2 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| A. Rostami | 1 | 7 | 1.90 |
| Adel Torkaman Rahmani | 2 | 139 | 19.77 |