Title | ||
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Fabrication and analysis of integrated MEMS pyramidal horn antenna for terahertz applications. |
Abstract | ||
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This paper reports the fabrication and analysis of a back-to-back pyramidal horn antenna based on Micro-electromechanical Systems (MEMS) technology, which is used in terahertz (THz) applications. This method is able to manufacture antenna with various geometrical configuration embedded in Si substrates. The dimensional tolerance of this technique is determined by the lithography process, which could be controlled down to tens nm. Therefore, this technique is controllable and of high precision and quality. The performance of fabricated antenna device was verified by Ansoft High Frequency Structure Simulator (HFSS) simulation. The result shows that the antenna gain ranges from 10-15dB, and voltage standing wave ratio (VSWR) is less than 2 in the frequency band of 3.25-3.55THz. © 2012 IEEE. |
Year | DOI | Venue |
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2012 | 10.1109/NEMS.2012.6196850 | NEMS |
Keywords | Field | DocType |
horn antennas,lithography,micromechanical devices,monolithic integrated circuits,submillimetre wave antennas,substrates,Ansoft high frequency structure simulator,HFSS simulation,MEMS technology,Si substrates,VSWR,antenna gain,antenna manufacture,back-to-back pyramidal horn antenna analysis,back-to-back pyramidal horn antenna fabrication,frequency 3.25 THz to 3.55 THz,gain 10 dB to 15 dB,geometrical configuration,integrated MEMS pyramidal horn antenna analysis,integrated MEMS pyramidal horn antenna fabrication,lithography process,micro-electromechanical systems,terahertz applications,voltage standing wave ratio,Horn Antenna,KOH etching,MEMS,THz | Standing wave ratio,Antenna (radio),Antenna gain,Antenna measurement,HFSS,Horn antenna,Antenna tuner,Antenna factor,Materials science,Optoelectronics | Conference |
Volume | Issue | Citations |
null | null | 0 |
PageRank | References | Authors |
0.34 | 0 | 5 |