Paper Info
Title
A dispatching rule for photolithography scheduling with an on-line rework strategy
Abstract
Generally speaking, wafer fabrication factories define the photolithography area as the dispatching center of the entire factory. To establish a set of operative dispatching rules in the photolithography area while taking into consideration the rework of defective products would assist in coordinating and balancing the workload of the entire production line. Furthermore, it would help to enhance both the productivity and efficiency of the wafer fabrication, reduce the on-line WIP stock, shorten the production cycle time, and satisfy the requirements of customers regarding production due time and product quality. This research uses on-line rework as the basis for bringing the factor of reworking of a batch process into the dispatching rule for measurement. It then develops the dispatching rule (Rw-DR) which includes the rework strategy. In addition, this research focuses on the batch with high finished proportion in the photolithography area for finding a way to complete the manufacturing procedure faster, lighten the machine workload of the waiting line, and at the same time increase the output quantity.
Year
DOI
Venue
2006
10.1016/j.cie.2006.04.002
Computers & Industrial Engineering
Keywords
Field
DocType
finished proportion,dispatching rule,entire production line,on-line rework,entire factory,on-line rework strategy,production cycle time,rework strategy,production due time,machine workload,photolithography scheduling,on-line wip stock,photolithography area,batch process,satisfiability,product cycle
Rework,Factory,Workload,Scheduling (computing),Wafer fabrication,Photolithography,Batch processing,Production line,Engineering,Operations management
Journal
Volume
Issue
ISSN
50
3
Computers & Industrial Engineering
Citations 
PageRank 
References 
8
0.72
1
Authors
4
Name
Order
Citations
PageRank
D. Y. Sha124110.80
S. Y. Hsu280.72
Z. H. Che322716.47
Chien-Hung Chen427036.65