Title
Advantages of Collocation Methods Over Finite Differences in One-Dimensional Monte Carlo Simulations of Submicron Devices
Abstract
Collocation methods are very useful when one-dimensional Monte Carlo simulations of semiconductor submicron devices require a very accurate solution of Poisson's equation. Potential and electric field may be solved simultaneously with better accuracy than using finite differences. The extension to two dimensions is also outlined. We present the results obtained for Monte Carlo simulation of submicron W/Si and AuGaAs Schottky barrier diodes under forward bias conditions. The accurate solution for the electric field at the ohmic contact boundary allows us to model the injected current and to account for depletion of carriers. Tunnelling effects across the barrier are also included in the simulation.
Year
DOI
Venue
1985
10.1109/TCAD.1985.1270155
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions
Keywords
Field
DocType
gallium arsenide,two dimensions,monte carlo method,finite difference methods,ohmic contacts,tunneling,monte carlo simulation,ohmic contact,schottky diodes,electric potential,semiconductor devices,finite difference,poisson equation,schottky barrier,schottky diode,collocation method,electric field,helium
Schottky barrier,Quantum tunnelling,Statistical physics,Monte Carlo method,Finite difference,Electronic engineering,Electric potential,Finite difference method,Dynamic Monte Carlo method,Semiconductor device,Physics
Journal
Volume
Issue
ISSN
4
4
0278-0070
Citations 
PageRank 
References 
0
0.34
0
Authors
4
Name
Order
Citations
PageRank
Umberto Ravaioli133.79
Paolo Lugli212419.26
Mohamed A. Osman310.71
Ferry, David K.400.34