Abstract | ||
---|---|---|
Increase of the process variability with aggressive technology scaling causes many productivity issues in VLSI manufacturing. Analysis about the relationship between process variability and failure has been performed to specify guidelines in both technology and design aspects for yield optimization. By applying the proposed methodology, the core scheme and the operating voltage of the 200MHz SRAM were determined to secure the immunity to operational failures. In DFM point of view, the statistical circuit analysis for failure characteristics is indispensable to guarantee an optimal yield in manufacturing. |
Year | DOI | Venue |
---|---|---|
2008 | 10.1109/ISQED.2008.108 | ISQED |
Keywords | Field | DocType |
operational failure,nano-scale era,statistical circuit analysis,yield optimization,failure characteristic,robust sram,aggressive technology scaling,dfm point,statistical failure analysis,optimal yield,vlsi manufacturing,process variability,core scheme,design optimization,dfm,design for manufacture,nanotechnology,statistical analysis,failure analysis,very large scale integration,productivity,voltage,robustness,sram | Computer science,Voltage,Electronic engineering,Static random-access memory,Robustness (computer science),Network analysis,Process variability,Very-large-scale integration,Design for manufacturability,Reliability engineering,Operating voltage | Conference |
Citations | PageRank | References |
1 | 0.37 | 2 |
Authors | ||
7 |
Name | Order | Citations | PageRank |
---|---|---|---|
Young-Gu Kim | 1 | 4 | 1.22 |
SooHwan Kim | 2 | 60 | 8.05 |
Hoon Lim | 3 | 1 | 0.37 |
Sanghoon Lee | 4 | 36 | 6.83 |
Keun-Ho Lee | 5 | 37 | 9.90 |
Young-Kwan Park | 6 | 29 | 4.67 |
Moon-Hyun Yoo | 7 | 12 | 3.84 |