Title
Transient thermo-reflectance measurements of the thermal conductivity and interface resistance of metallized natural and isotopically-pure silicon
Abstract
The transient thermoreflectance method has been used to measure the thermal conductivity of natural silicon and isotopically-pure silicon-28 layers that are epitaxially grown on natural silicon substrates. The measurements were performed at room temperature for both a low level (1016) and a higher level (2×1019) of Boron doping of the epitaxial layers. The results indicate a gain of approximately 55% in the thermal conductivity of Si28 as compared to that of natural Si, at both low and higher levels of doping, and a loss of approximately 19% for both types of silicon due to the higher level of doping.
Year
DOI
Venue
2003
10.1016/S0026-2692(03)00201-5
Microelectronics Journal
Keywords
Field
DocType
Transient thermoreflectance method,Epitaxial layer,Natural silicon,Isotopically-pure silicon-28,Boron doping,Thermal conductivity
BORO,Doping,Waveform,Boron,Engineering,Reflectivity,Optoelectronics,Silicon,Condensed matter physics,Epitaxy,Thermal conductivity
Journal
Volume
Issue
ISSN
34
12
0026-2692
Citations 
PageRank 
References 
2
0.91
0
Authors
4
Name
Order
Citations
PageRank
Pavel L. Komarov121.93
Mihai G. Burzo2384.54
Gunhan Kaytaz320.91
Peter E. Raad422.94