Name
Abstract | ||
|---|---|---|
A miniature SAW device is designed and fabricated at 1GHz for wireless communication system. A 5@mm thin film of ZnO is successfully deposited using RF sputtering technique on plasma-enhanced chemical deposition (PECVD) SiO"2 layer of 1@mm on top of Si wafer under various operating conditions. The c-axis-oriented ZnO film exhibit a sharp diffraction peak corresponding to the (002) reflection at 2@q=34.42. The fabrication process utilizing the micro-electro-mechanical systems (MEMS) technology of the SAW device is described. Simulation of the RF-SAW filter is performed. Measurements and experimental work are presented for the RF-SAW device. |
Year | DOI | Venue |
|---|---|---|
2007 | 10.1016/j.mejo.2006.11.010 | Microelectronics Journal |
Keywords | Field | DocType |
plasma-enhanced chemical deposition,fabrication process,mems technology,rf sputtering technique,rf-saw device,experimental work,mm thin film,si wafer,c-axis-oriented zno film exhibit,rf-saw filter,micro-electro-mechanical system,thin film,operant conditioning | Sputtering,Wafer,Plasma-enhanced chemical vapor deposition,Microelectromechanical systems,Surface acoustic wave,Electronic engineering,Engineering,Thin film,Diffraction,Fabrication | Journal |
Volume | Issue | ISSN |
38 | 3 | Microelectronics Journal |
Citations | PageRank | References |
2 | 0.47 | 0 |
Authors | ||
3 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Amal Zaki | 1 | 3 | 2.19 |
| Hamed Elsimary | 2 | 7 | 3.44 |
| Mona E. Zaghloul | 3 | 73 | 19.65 |