Name
Title | ||
|---|---|---|
Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process |
Abstract | ||
|---|---|---|
This paper describes a new simple process model for photoresist development. The model includes the consideration of chemical reactions between a photoresist and a developer, and takes the developer concentration dependence into account. The model is applied to the design of practical photo-lithography processes to determine development conditions. Through the introduction of the model-based lithographic simulations, the multilayer resist process has been successfully designed and has obtained satisfactory patterns. |
Year | DOI | Venue |
|---|---|---|
1987 | 10.1109/TCAD.1987.1270285 | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems |
Keywords | DocType | Volume |
Photoresist Development,chemical reaction,photoresist development,development condition,Double-Layer Resist,model-based lithographic simulation,developer concentration dependence,Single Development,new simple process model,satisfactory pattern,practical photo-lithography | Journal | 6 |
Issue | ISSN | Citations |
3 | 0278-0070 | 0 |
PageRank | References | Authors |
0.34 | 0 | 5 |
Name | Order | Citations | PageRank |
|---|---|---|---|
| Yoshikazu Hirai | 1 | 0 | 2.37 |
| Sasago, M. | 2 | 0 | 0.34 |
| Masayuki Endo | 3 | 0 | 0.68 |
| Tsuji, K. | 4 | 0 | 0.68 |
| Y. Mano | 5 | 0 | 0.34 |