Abstract | ||
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We demonstrate the wavelength trimming of MEMS VCSELs by etching a cantilever-shaped top mirror using FIB etching. The proposed technique can be used for the post-process precise wavelength allocation of athermal MEMS VCSELs. The modeling and experimental results on 850 nm MEMS VCSELs are presented. The results show a possibility of realizing both red-shift and blue-shift wavelength changes by choosing the etching area of the cantilever. |
Year | DOI | Venue |
---|---|---|
2012 | 10.1587/transele.E95.C.237 | IEICE TRANSACTIONS ON ELECTRONICS |
Keywords | Field | DocType |
VCSEL, MEMS, wavelength trimming, WDM, optical Interconnects | Wavelength-division multiplexing,Etching,Microelectromechanical systems,Cantilever,Optics,Electronic engineering,Engineering,Vertical-cavity surface-emitting laser,Trimming,Optoelectronics,Wavelength,Wavelength allocation | Journal |
Volume | Issue | ISSN |
E95C | 2 | 0916-8524 |
Citations | PageRank | References |
0 | 0.34 | 1 |
Authors | ||
4 |
Name | Order | Citations | PageRank |
---|---|---|---|
Hayato Sano | 1 | 3 | 1.88 |
Norihiko Nakata | 2 | 0 | 0.68 |
Akihiro Matsutani | 3 | 0 | 2.37 |
Fumio Koyama | 4 | 4 | 7.57 |