Title
Performance evaluation of photolithography cluster tools
Abstract
The photolithography cluster tool is typically the most expensive tool set utilized in the production of semiconductor wafers and is often selected as a fabricator bottleneck. Modeling such a tool as a serial processing cluster tool, we deduce measures of tool performance. Queueing models reveal that the mean cycle time in the presence of a Poisson arrival process is related to the parallelism inherent in the system configuration. As a consequence, the normalized mean cycle time behavior has a different form than that of the standard single server queue. The process time of a lot and the throughput are evaluated in the presence of disruptions common in practical manufacturing environments. For multiple products with different process rates, it is shown that the throughput is not influenced by the order in which the lots are sequenced.
Year
DOI
Venue
2007
10.1007/s00291-006-0061-4
Or Spektrum
Keywords
Field
DocType
photolithography cluster tools · queueing models · cycle time · throughput · workload sequencing,cycle time
Bottleneck,Economics,Normalization (statistics),Petri net,Serial memory processing,System configuration,Photolithography,Queueing theory,Throughput,Operations management
Journal
Volume
Issue
ISSN
29
3
0171-6468
Citations 
PageRank 
References 
12
1.63
1
Authors
2
Name
Order
Citations
PageRank
James R. Morrison119526.43
Donald P. Martin2233.35