Name
Title | ||
|---|---|---|
Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing. |
Abstract | ||
|---|---|---|
•Wavelet-based EWMA statistic with adaptive thresholding method proposed.•Local shifting of functional data is of major significance.•Features extracted from functional data in the wavelet domain. |
Year | DOI | Venue |
|---|---|---|
2013 | 10.1016/j.eswa.2013.04.016 | Expert Systems with Applications |
Keywords | Field | DocType |
EWMA,Functional data,Plasma etching process,Local shift monitoring,Optical emission spectroscopy | Data mining,Nonlinear system,Computer science,Statistical process control,Artificial intelligence,Thresholding,Wavelet,Pattern recognition,Test statistic,Semiconductor device fabrication,EWMA chart,Curse of dimensionality,Statistics | Journal |
Volume | Issue | ISSN |
40 | 14 | 0957-4174 |
Citations | PageRank | References |
2 | 0.47 | 3 |
Authors | ||
3 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Young-Seon Jeong | 1 | 367 | 21.07 |
| Byungwhan Kim | 2 | 12 | 6.13 |
| Young-Don Ko | 3 | 12 | 4.16 |