Name
Title | ||
|---|---|---|
Rapid thermal plasma deposition of transparent nanocrystalline ZnO thin films and the effects of annealing |
Abstract | ||
|---|---|---|
Conductive, undoped zinc oxide nanocrystalline thin film with predominant c-axis orientation is prepared on crystalline and amorphous substrates using a rapid, one-step ambient-pressure, thermal plasma chemical vapor deposition process. Nonporous and conformal zinc oxide films can be prepared at temperature as low as 160°C, with an average grain size of 25 nm. Scanning electron micrographs indicate a growth rate of 15~50 nm/min, depending on factor including source temperature, deposition temperature, and pressure. X-ray diffraction shows a predominant (002) grain orientation that is independent of the substrate's crystallinity. For films with thickness of 200 nm, the average electrical conductivity ranges from 60-910 S/m. The results demonstrate the potential of thermal plasma CVD for the rapid synthesis of conductive zinc oxide film at ambient condition. |
Year | DOI | Venue |
|---|---|---|
2012 | 10.1109/NEMS.2012.6196770 | NEMS |
Keywords | Field | DocType |
conductive transparent nanocrystalline thin films,transparent nanocrystalline film,nanoporous materials,crystallinity,nanofabrication,wide band gap semiconductors,conducting materials,size 200 nm,nanorods,electrical conductivity,annealing,zinc oxide,grain size,ii-vi semiconductors,x-ray diffraction,rapid thermal plasma deposition,semiconductor growth,scanning electron micrography,transparency,scanning electron microscopy,amorphous substrates,chemical vapor deposition,nanoporosity,zinc compounds,plasma cvd,zno,rapid thermal processing,thermal plasma chemical vapor deposition,semiconductor thin films,grain orientation,orifices,thin film,heating,electric conductivity,scanning electron micrograph,palladium,x ray diffraction | Analytical chemistry,Rapid thermal processing,Annealing (metallurgy),Thin film,Crystallinity,Nanocrystalline material,Materials science,Carbon film,Amorphous solid,Chemical vapor deposition | Conference |
ISBN | Citations | PageRank |
978-1-4673-1122-9 | 0 | 0.34 |
References | Authors | |
0 | 3 | |
Name | Order | Citations | PageRank |
|---|---|---|---|
| Kwok Siong Teh | 1 | 0 | 1.01 |
| Joachim Pedersen | 2 | 0 | 0.34 |
| Heather Esposito | 3 | 0 | 0.34 |