Title
Measurement Of Integrated Pa-To-Lna Isolation On Si Cmos Chip
Abstract
This paper presents measurement of on-chip coupling between PA and LNA integrated on Si CMOS substrate, which is caused by substrate coupling, magnetic coupling, power-line coupling, etc. These components are decomposed by measurements using diced chips. The result reveals that the substrate coupling is the most dominant in CMOS chips and the total isolation becomes less than -50 dB with more than 0.4 mm PA-to-LNA distance.
Year
DOI
Venue
2011
10.1587/transele.E94.C.1057
IEICE TRANSACTIONS ON ELECTRONICS
Keywords
Field
DocType
CMOS, power amplifier, substrate coupling, Tx leakage, mutual coupling
Substrate (chemistry),Low-noise amplifier,Coupling,Inductive coupling,CMOS,Electronic engineering,Substrate coupling,Power electronics,Engineering,Electrical engineering,Amplifier
Journal
Volume
Issue
ISSN
E94C
6
0916-8524
Citations 
PageRank 
References 
0
0.34
0
Authors
4
Name
Order
Citations
PageRank
Ryo Minami1858.62
Jee Young Hong201.01
Kenichi Okada3497100.11
Akira Matsuzawa446588.10