Title
A Homogenization Technique for the Boltzmann Equation for Low Pressure Chemical Vapor Deposition
Abstract
We present a homogenization technique for rarefied gas flow over a microstructured surface consisting of patterns of periodic features. The length scale of the model domain is comparable to the mean free path of the molecules, while the scale of the surface patterns is much smaller. The flow is modeled by a system of linear Boltzmann equations with a diffusive boundary condition at the patterned surface. The resulting homogenized boundary condition holds at a virtual. at surface and incorporates the microscopic geometry information about the surface structure on the macroscopic level. Numerical results validate the approach. The setup models low pressure chemical vapor deposition processes in the manufacturing of integrated circuits.
Year
DOI
Venue
2003
10.1137/S0036139902393476
SIAM JOURNAL ON APPLIED MATHEMATICS
Keywords
Field
DocType
Boltzmann equation,rarefied gas dynamics,boundary homogenization,microstructured surface,chemical vapor deposition
Mean free path,Boundary value problem,Boltzmann equation,Length scale,Thermodynamics,Homogenization (chemistry),Mathematical analysis,Mechanics,Boltzmann constant,Periodic graph (geometry),Mathematics,Chemical vapor deposition
Journal
Volume
Issue
ISSN
64
1
0036-1399
Citations 
PageRank 
References 
0
0.34
3
Authors
2
Name
Order
Citations
PageRank
Christian Ringhofer14111.88
Matthias K. Gobbert23110.72