Name
Abstract | ||
|---|---|---|
A fabrication process of microlens array using multiple plane waves interference is described. Maskless exposure system is superposed on a photoresist coated substrate layer. Multiple plane waves interference is provided by the refractions of gratings. The period of microlens array range from 1um to 10um and the diameter of single microlen can be produced less than the period. Furthermore large area of micro arrays can be realized with low cost. |
Year | DOI | Venue |
|---|---|---|
2010 | 10.1109/NEMS.2010.5592208 | NEMS |
Keywords | Field | DocType |
holographic optical components,microlens array,maskless exposure system,microlenses,photoresist coated substrate layer,holography,interference,multiple plane waves interference,photoresists,plane waves | Microlens,Holography,Plane wave,Optics,Photoresist,Interference (wave propagation),Optoelectronics,Materials science,Fabrication | Conference |
Volume | Issue | ISBN |
null | null | 978-1-4244-6543-9 |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
5 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Gaoming Li | 1 | 0 | 0.68 |
| Shou Liu | 2 | 0 | 0.34 |
| Gouhua Liu | 3 | 0 | 0.34 |
| Yishen Qiu | 4 | 0 | 1.69 |
| Xiaoyun Chen | 5 | 3 | 2.07 |