Name
Abstract | ||
|---|---|---|
The failure criterion for long metal stripes designed for electromigration, tests is fixed much earlier than the complete opening of the stripes themselves. This calls for other methods for detecting the electromigrated points than the simple open-circuit localization by, i.e., EBT techniques. A new method, based on the branching of the SEM specimen current caused by the stripe structure, is presented. It should address detailed FIB/SEM inspection to the relevant positions, saving most of the excessively long time that a systematic FIB approach would require. (C) 2002 Elsevier Science Ltd. All rights reserved. |
Year | DOI | Venue |
|---|---|---|
2002 | 10.1016/S0026-2714(02)00218-4 | Microelectronics Reliability |
Keywords | Field | DocType |
electromigration | Engineering,Electromigration,Reliability engineering,Branching (version control),Nuclear engineering | Journal |
Volume | Issue | ISSN |
42 | 9 | 0026-2714 |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
6 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| C. Caprile | 1 | 0 | 0.34 |
| I. De Munari | 2 | 2 | 1.43 |
| M. Improntac | 3 | 0 | 0.34 |
| S. Podda | 4 | 19 | 10.88 |
| Andrea Scorzoni | 5 | 3 | 3.26 |
| M. Vanzi | 6 | 89 | 33.52 |