Abstract | ||
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Abstract: Micro-systems technology is a fast developing field that takes advantage of the well established Si micro-electronics technology. In this paper we present the concepts and process flow of the technological elaboration of a pressure sensor. This approach places the emphasis on the key technologies of micro-systems and includes the use of double face photolithography as well as bulk micro-machining. It also benefits of standard clean room equipment. |
Year | DOI | Venue |
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2001 | 10.1109/MSE.2001.932429 | MSE |
Keywords | Field | DocType |
micro-systems technology,si micro-electronics technology,bulk micro-machining,process flow,key technology,standard clean room equipment,pressure sensor,technological elaboration,double face photolithography,micro-system process,micromachining,microelectronics,photolithography,fabrication,doping,wet etching,pressure sensors,clean rooms,lithography,educational technology,si | Computer architecture,Surface micromachining,Microelectronics,Mechanical engineering,Electronic engineering education,Photolithography,Cleanroom,Pressure sensor,Engineering,Computational lithography,Electrical engineering,Fabrication | Conference |
ISBN | Citations | PageRank |
0-7695-1156-2 | 1 | 0.63 |
References | Authors | |
0 | 8 |
Name | Order | Citations | PageRank |
---|---|---|---|
Laurent Montès | 1 | 1 | 0.96 |
Lionel Palun | 2 | 1 | 0.96 |
Panagiota Morfouli | 3 | 1 | 1.64 |
Nathalie Mathieu | 4 | 1 | 1.30 |
Nadine Guillemot | 5 | 1 | 0.96 |
Sandrine Descheneaux | 6 | 1 | 0.96 |
Jean-Michel Terrot | 7 | 1 | 0.96 |
Christophe Malhaire | 8 | 1 | 0.96 |