Name
Abstract | ||
|---|---|---|
DFM has taken shape by virtue of manufacturers defining a series of "DFM activities", related to parametric and stochastic yield analysis and recommendations for design changes to improve yield. The picture is made more complex because the view from integrated device manufacturers, pure play foundries, and fabless semiconductor companies is not necessarily the same as they have different needs and constrains. This panel brings together DFM practitioners from each of these communities to discuss real experiences on the adoption level achieved so far as well as the impact in the manufactured products. The panel should be of interest of designers moving to advanced nodes (to learn from the experience of those that have "done it already") as well as those in the leading edge (such that they can compare experiences). |
Year | DOI | Venue |
|---|---|---|
2008 | 10.1145/1391469.1391696 | DAC |
Keywords | Field | DocType |
dfm activity,yield,leading edge,cmp,dfm practitioner,adoption level,advanced node,opc,lithography,design change,critical area analysis,integrated device manufacturer,fabless semiconductor company,dfm,different need,stochastic yield analysis,design for manufacture,production,layout,graphics,shape,robustness | Critical area analysis,Graphics,Computer science,Manufacturing engineering,Electronic engineering,Design for manufacturability | Conference |
Citations | PageRank | References |
1 | 0.58 | 1 |
Authors | ||
8 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Juan C. Rey | 1 | 3 | 1.62 |
| NS Nagaraj | 2 | 3 | 1.05 |
| Andrew B. Kahng | 3 | 7582 | 859.06 |
| Fabian Klass | 4 | 77 | 9.56 |
| Rob Aitken | 5 | 1 | 0.92 |
| Cliff Hou | 6 | 7 | 1.92 |
| Luigi Capodieci | 7 | 21 | 3.69 |
| Vivek Singh | 8 | 1 | 0.58 |