Title
Characterization And Analysis Of Gate-All-Around Si Nanowire Transistors For Extreme Scaling
Abstract
The gate-all-around (GAA) silicon nanowire transistor ( SNWT) is considered as one of the best candidates for ultimately scaled CMOS devices at the end of the technology roadmap. This paper reviews our recent work on the characterization and analysis of this unique one-dimensional nanowire-channel device with three-dimensional surrounding-gate from experiments and simulation, including carrier transport behavior, parasitic effects, noise characteristics, self-heating effect, variability and reliability, which can provide useful information for the GAA device hierarchical modeling and device/circuit co-design.
Year
DOI
Venue
2011
10.1109/CICC.2011.6055334
2011 IEEE CUSTOM INTEGRATED CIRCUITS CONFERENCE (CICC)
Keywords
Field
DocType
nanowires
Infrasound,Computer science,Technology roadmap,CMOS,Electronic engineering,Transistor,MOSFET,Scaling,Nanowire,Silicon
Conference
Volume
Issue
Citations 
null
null
1
PageRank 
References 
Authors
0.40
1
13
Name
Order
Citations
PageRank
Ru Huang118848.74
Runsheng Wang216921.11
Jing Zhuge320.77
Changze Liu462.27
tao yu5200.86
Liangliang Zhang6167.01
Xin Huang710.40
Yujie Ai810.73
Jinbin Zou920.77
Yuchao Liu10718.21
Jiewen Fan1110.40
Huailin Liao128314.91
Yangyuan Wang1314223.85