Title
Electrical characterizations of preamorphized junctions under LF magnetic field
Abstract
The increased requirements for reduction of electronic system dimensions, essentially in embedded equipment such as automotive and avionics, lead to juxtapose high power modules and low level modules on the same printed circuit. This juxtaposition induces electromagnetic perturbations that can disturb or damage the operation of the system. In order to study thoroughly these phenomena, a low frequency (LF) magnetic field was applied to shallow P+N junctions obtained by the preamorphization technique, at two temperatures: ambient and nitrogen temperature. Electrical characterizations were performed on the different samples. The results show that the impact of the LF magnetic field is essentially observed in the generation-recombination region of the junction. Moreover, it appears that crystalline sample presents a good immunity to the LF magnetic field perturbation at high temperature. On the other hand, the preamorphization temperature influences the response of the sample. So, a good control of the technological parameters will permit to reduce or cancel the effect of the magnetic perturbations on the electronic components since conception.
Year
DOI
Venue
2003
10.1016/j.mejo.2003.09.008
Microelectronics Journal
Keywords
Field
DocType
Ac magnetic field,Low frequency,Preamorphization,Defects
Low frequency,Magnetic field,p–n junction,Power module,Electronic engineering,Electromagnetic compatibility,Power electronics,Engineering,Electronic component,Alternating current,Condensed matter physics
Journal
Volume
Issue
ISSN
34
11
0026-2692
Citations 
PageRank 
References 
0
0.34
0
Authors
5
Name
Order
Citations
PageRank
M. Abdelaoui101.01
M. Idrissi-Benzohra211.79
H. Mehor300.34
M. Benzohra422.53
F. Olivié510.75