Paper Info
Title
Predictive formulae for OPC with applications to lithography-friendly routing
Abstract
Due to the subwavelength lithography, manufacturing sub-90-nm feature sizes require intensive use of resolution-enhancement techniques, among which optical proximity correction (OPC) is the most popular technique in industry. Considering the OPC effects during routing can significantly alleviate the cost of postlayout OPC operations. In this paper, we present an efficient, accurate, and economical analytical formula for intensity computation and develop the first modeling of postlayout OPC based on a quasi-inverse lithography technique. The technique provides key insights into a new direction for postlayout OPC modeling during routing. Extensive simulations with SPLAT, the golden lithography simulator in academia and industry, show that our intensity formula has high fidelity. Incorporating the OPC costs computed by the quasi-inverse lithography technique for our postlayout OPC modeling into a router, the router can be guided to maximize the effects of the correction. Compared with a rule-based OPC method, the experimental results show that our approach can achieve 15% and 16% reductions in the maximum and average layout distortions, respectively.
Year
DOI
Venue
2010
10.1109/TCAD.2009.2032359
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions
Keywords
Field
DocType
subwavelength lithography,resolutionenhancement technique,golden lithography simulator,postlayout OPC operation,rule-based OPC method,popular technique,quasi-inverse lithography technique,postlayout OPC,postlayout OPC modeling,OPC effect,Predictive formula
Aperture,High fidelity,Optical proximity correction,Computer science,Electronic engineering,Lithography,Nanolithography,Router,Design for manufacturability,Computation
Journal
Volume
Issue
ISSN
29
1
0278-0070
Citations 
PageRank 
References 
16
1.52
11
Authors
3
Name
Order
Citations
PageRank
Tai-Chen Chen1877.99
Guang-Wan Liao2182.59
Yao-Wen Chang33437253.54