Title
Fabrication of complicated three dimensional structures utilizing multi-stack bonding
Abstract
Hybrid multi-wafer bonding that combines both anodic bonding and silicon direct bonding is one of the most promising manufacturing techniques for creating complex three-dimensional (3D) structures. However, the results of some key micro-fabrication processes will significantly influence the performance of 3D multilayered devices. These problems include: (1) electrical conduction property across the interface of hydrophilic direct bonded wafers; (2) the fabrication of silicon wire. Some key techniques are developed to solve these problems. These solutions are also applicable to fabricate other Microelectromechanical System devices with complex 3D structures.
Year
DOI
Venue
2009
10.1109/NEMS.2009.5068767
NEMS
Keywords
Field
DocType
promising manufacturing technique,multi-stack bonding,3d structure,hybrid multi-wafer bonding,silicon direct bonding,3d multilayered devices,multi stack bonding,dimensional structure,complicated three dimensional structures,anodic bonding,key micro-fabrication process,microelectromechanical system device,silicon wire,multi-wafer bonding,key technique,semiconductor device manufacture,microfabrication,multilayered device,wafer bonding,microfabrication processes,multilayers,electrical conduction property,silicon,etching,resistance,electric conductivity,atomic layer deposition,three dimensional,fabrication
Wafer,Nanotechnology,Wire bonding,Wafer bonding,Anodic bonding,Direct bonding,Materials science,Silicon,Fabrication,Microfabrication
Conference
ISSN
ISBN
Citations 
2474-3747
978-1-4244-4630-8
0
PageRank 
References 
Authors
0.34
0
5
Name
Order
Citations
PageRank
Mingda Zhou1101.65
Yilong Hao2124.49
Chengchen Gao3113.74
Zhihong Li46227.17
Qifang Hu501.01