Name
Title | ||
|---|---|---|
Yield improvement via minimisation of step height non-uniformity in chemical mechanical planarisation (CMP) with pressure and velocity as control variables |
Year | DOI | Venue |
|---|---|---|
2005 | 10.1504/IJMTM.2005.007698 | IJMTM |
Keywords | Field | DocType |
silicon wafers,wafer fabrication,semiconductor manufacturing | Flatness (systems theory),Planarity testing,Dielectric,Semiconductor device fabrication,Pressure control,Minimisation (psychology),Control variable,Engineering,Operations management,Chemical-mechanical planarization | Journal |
Volume | Issue | Citations |
7 | 5/6 | 0 |
PageRank | References | Authors |
0.34 | 0 | 4 |
Name | Order | Citations | PageRank |
|---|---|---|---|
| Muthukkumar S. Kadavasal | 1 | 12 | 2.21 |
| Abhijit Chandra | 2 | 12 | 3.72 |
| Sutee Eamkajornsiri | 3 | 0 | 0.34 |
| Ashraf-F. Bastawros | 4 | 0 | 0.68 |