Title
Modeling of heat transfer for laser-assisted direct nano imprint processing
Abstract
The melting duration and molten depth are key information for laser-assisted direct imprinting, which raises issues about the melting & solidification induced by excimer-pulse-laser irradiating through unilaterally transparent binary materials. Considering the size-effect on thermal conductivity and phase-change of irradiated material, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. Results in this study indicate that the laser-annealing case as well as the perfect-contact case provides the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing values of thermal-contact resistance
Year
DOI
Venue
2005
10.1109/ROBIO.2005.246362
ROBIO
Keywords
Field
DocType
laser-annealing,nanolithography,irradiated material,direct nano imprint processing,thermal-contact resistance,laser-assisted direct imprinting,phase-change,laser beam annealing,thermal conductivity,heat transfer,lower bound,thermal contact resistance,upper bound,phase change
Thermal contact conductance,Composite material,Control theory,Heat transfer,Irradiation,Laser,Nanolithography,Engineering,Thermal conduction,Nano-,Thermal conductivity
Conference
ISBN
Citations 
PageRank 
0-7803-9315-5
0
0.34
References 
Authors
0
7
Name
Order
Citations
PageRank
Fei-Bin Hsiao1359.41
Di-Bao Wang251.00
Chun-ping Jen3107.42
Huiju Hsu401.01
Cheng-Hsin Chuang594.73
Yung-Chun Lee655.73
Chuan-Pu Liu700.34