Name
Title | ||
|---|---|---|
Preparation and performance study of TiN films deposited by MF unbalanced magnetron sputtering technique |
Abstract | ||
|---|---|---|
TiN films on 316L were deposited by middle frequency unbalanced magnetron sputtering plating (MF-LTBMSP). The phase structure, roughness, thickness, surface morphology and color of the films were assessed by using XRD, Surface Profilometer, SEM, Spectrophotometer and Nano Mechanics measuring instrument. The characteristics of the films were compared with TiN films deposited by traditional arc ion plating. The results show that TiN films can be steadily deposited by middle frequency unbalanced twin target magnetron sputtering under proper parameters. The main phase of the films is TiN. The film is compact, its surface is smooth, and its color is close to TiN film deposited by arc ion plating (AIP). It is concluded that ambience has greatest effect on the component and appearance color of TiN coating, the pulse bias and sputtering power have influence too. The range of ambience to get perfect gold-like TiN is quite limited. Suitable direct current bias and higher sputtering power are helpful to improve the coating's quality. |
Year | DOI | Venue |
|---|---|---|
2007 | 10.1504/IJCAT.2007.015257 | ADVANCES IN ABRASIVE MACHINING AND SURFACING TECHNOLOGIES, PROCEEDINGS |
Keywords | Field | DocType |
twin middle frequency sputtering,unbalanced magnetrbn sputtering,TiN,pulse bias | Sputtering,Ion plating,Composite material,Tin,Coating,Scanning electron microscope,Physical vapor deposition,Sputter deposition,Titanium nitride,Control engineering,Engineering | Journal |
Volume | Issue | ISSN |
29 | 2/3/4 | 0952-8091 |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
6 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Y. C. Zhang | 1 | 0 | 0.34 |
| Y. F. Wu | 2 | 6 | 1.30 |
| S. G. Ma | 3 | 0 | 0.34 |
| S. N. Sun | 4 | 0 | 0.34 |
| Yonghui Zhou | 5 | 8 | 2.74 |
| M. Geng | 6 | 0 | 0.34 |