Title
Electro- and thermomigration induced Cu3Sn and Cu6Sn5 formation in SnAg3.0Cu0.5 bumps.
Abstract
•AC stress tests on SnAgCu bumps on Cu contact pads.•Long- and short-term investigation of the Cu3Sn and Cu6Sn5 formation.•Material parameters for the modeling of the electromigration and thermomigration driven Cu3Sn and Cu6Sn5 formation.
Year
DOI
Venue
2015
10.1016/j.microrel.2014.09.030
Microelectronics Reliability
Keywords
Field
DocType
Intermetallic compound (IMC) formation,Transient liquid phase soldering (TLPS),Electromigration,Thermomigration,Heat of transport,Effective charge of the moving ion
Mass flux,Intermetallic,Microelectronics,Electronic engineering,Soldering,Metallurgy,Miniaturization,Effective nuclear charge,Engineering,Electromigration,Fabrication
Journal
Volume
Issue
ISSN
55
1
0026-2714
Citations 
PageRank 
References 
1
0.41
5
Authors
4
Name
Order
Citations
PageRank
Lutz Meinshausen183.47
Hélène Frémont22012.71
Kirsten Weide-Zaage33114.97
Bernard Plano410.41