Title
A novel partial-SOI LDMOSFET (>800 V) with n-type floating buried layer in substrate.
Abstract
•New P-SOI LDMOS structure with n-type floating buried layer in the substrate.•The proposed structure improves the BV and reduces specific on-resistance.•Self-heating effects are also suppressed in the proposed structure.
Year
DOI
Venue
2014
10.1016/j.microrel.2013.10.021
Microelectronics Reliability
Field
DocType
Volume
Silicon on insulator,Electric field,LDMOS,Field-effect transistor,Electronic engineering,Breakdown voltage,Engineering,Thermal conduction,High voltage,Silicon
Journal
54
Issue
ISSN
Citations 
3
0026-2714
0
PageRank 
References 
Authors
0.34
1
8
Name
Order
Citations
PageRank
Chao Xia100.34
Xinhong Cheng202.37
Zhongjian Wang332.43
Duo Cao400.34
Tingting Jia531.11
Li Zheng600.34
Yuehui Yu711.33
Dashen Shen800.34