Title
Pulsed laser deposition (PLD) of hafnium oxide thin films
Abstract
This work contains the experimental investigation of optical properties of HfO2 (hafnium oxide) thin films grown on quartz and n-type silica substrates by pulsed laser deposition method. Cold pressed powders of hafnium oxide (HfO2 98% - Aldrich Chem. Co.) were used as the target for deposition process. The substrates was heated up to temperature in the range between 200 and 500 °C. Optical properties of the films were investigated by transmittance in the ultra-violet, visible and near infrared range and photoluminescence spectroscopy. We measure the photo-luminescence spectra and dynamics of luminescence process. Optical properties are closely related to the structure of the hafnium oxide thin films.
Year
DOI
Venue
2014
10.1109/ICTON.2014.6876620
Transparent Optical Networks
Keywords
DocType
ISSN
hafnium compounds,heat treatment,infrared spectra,photoluminescence,pressing,pulsed laser deposition,thin films,ultraviolet spectra,visible spectra,hfo2,sio2,cold pressed powders,experimental analysis,hafnium oxide thin films,heating,luminescence process,n-type silica substrate,near infrared spectroscopy,optical properties,photoluminescence spectroscopy,quartz substrate,temperature 200 degc to 500 degc,ultraviolet spectroscopy,visible spectroscopy,pld (pulsed laser deposition),hafnium oxide,transmission,temperature measurement
Conference
2162-7339
Citations 
PageRank 
References 
0
0.34
0
Authors
5
Name
Order
Citations
PageRank
p plociennik100.34
Zawadzka, A.201.35
j strzelecki300.34
zbigniew lukasiak400.34
andrzej korcala502.37