Title
Analysis of InAs-Si heterojunction nanowire tunnel FETs: Extreme confinement vs. bulk
Abstract
Abstract Extremely narrow and bulk-like p-type InAs–Si nanowire TFETs are studied using (i) a full-band and atomistic quantum transport simulator based on the sp 3 d 5 s ∗ tight-binding model and (ii) a drift–diffusion TCAD tool. As (iii) option, a two-band model and the WKB approximation have been adapted to work in heterostructures through a careful choice of the imaginary dispersion. It is found that for ultra-scaled InAs–Si nanowire TFETs, the WKB approximation and the quantum transport results agree very well, suggesting that the former could be applied to larger hetero-TFET structures and considerably reduce the simulation time while keeping a high accuracy.
Year
DOI
Venue
2014
10.1109/ESSDERC.2014.6948772
Solid State Device Research Conference
Keywords
Field
DocType
III-V semiconductors,field effect transistors,indium compounds,nanowires,silicon,tight-binding calculations,tunnel transistors,InAs-Si,InAs-Si heterojunction nanowire tunnel FET,TCAD tool,WKB approximation,atomistic quantum transport,bulk-like nanowire TFET,drift-diffusion,extreme confinement,extremely narrow TFET,p-type InAs-Si nanowire TFET,tight-binding model,ultra-scaled InAs-Si nanowire TFET
Dispersion (optics),Quantum transport,Chemistry,Electronic engineering,WKB approximation,Heterojunction,Nanowire
Conference
Volume
ISSN
Citations 
113
1930-8876
1
PageRank 
References 
Authors
0.48
1
3
Name
Order
Citations
PageRank
Hamilton Carrillo-Nunez110.82
Mathieu Luisier2568.55
A. Schenk364.24