Paper Info
Title
Epoxy-based permeable membrane fabrication for 3D microfluidic device
Abstract
We report for the first time on a simple fabrication via UV photolithography for a free-standing filtration membrane made of epoxy-based photoresist and its integration on a multilevel microfluidic device. The fabrication process involves three-dimensional thick-photoresist microstructuring combined with standard negative photoresist processing. In this paper, a primary feature of membrane permeability dependence on fabrication process parameters was characterized by employing a cross-linking reaction model. The experiments using a multilevel microfluidic device demonstrated the proposed fabrication is capable of fabricating nano-filtration membrane while maintaining a sufficient mechanical strength for applications in polymer-based microfluidic devices.
Year
DOI
Venue
2011
10.1109/NEMS.2011.6017325
Nano/Micro Engineered and Molecular Systems
Keywords
Field
DocType
mechanical strength,membranes,microfabrication,microfiltration,microfluidics,nanofabrication,nanofiltration,permeability,photoresists,polymers,ultraviolet lithography,3D multilevel microfluidic device,UV photolithography,cross-linking reaction model,epoxy-based permeable membrane fabrication,epoxy-based photoresist,free-standing filtration membrane,mechanical strength,nano-filtration membrane,polymer-based microfluidic device,standard negative photoresist processing,three-dimensional thick-photoresist microstructure,UV lithography,chemically amplified resist,cross-linking reaction,filteration membrane,microfluidics,photoresist,three-dimensional microfabrication
Nanotechnology,Microfluidics,Photolithography,Membrane,Photoresist,Semipermeable membrane,Nanolithography,Materials science,Fabrication,Microfabrication
Conference
ISBN
Citations 
PageRank 
978-1-61284-775-7
0
0.34
References 
Authors
0
4
Name
Order
Citations
PageRank
Yoshikazu Hirai102.37
Nakai, Y.210.72
Makino, Y.351.29
Koji Sugano402.03