Title
Lifetime prediction of channel hot carrier degradation in pMOSFETs separating NBTI component
Abstract
Channel hot-carrier (CHC) degradation in p-channel MOSFETs essentially includes negative bias temperature instabilities (NBTI), which would lead to over-estimate the CHC degradation. Therefore, a separation of the BTI component from CHC degradation is necessary to predict device lifetime more accurately. In this study, a simple lifetime prediction method separating NBTI and CHC component from sequential CHC test (i.e. alternate stress and relax) data is proposed, focusing on the recovery phenomenon, which is a distinctive behavior of NBTI.
Year
DOI
Venue
2012
10.1109/ICICDT.2012.6232842
ICICDT
Keywords
Field
DocType
mosfet,hot carriers,life testing,thermal stability,nbti component,channel hot carrier degradation,device lifetime,lifetime prediction,negative bias temperature instabilities,p-channel mosfets,pmosfets,channel hot carrier,lifetime,nbti,recovery,reliability,pmosfet,negative bias temperature instability,logic gates,stress,degradation,logic gate
Logic gate,Hot carrier degradation,Communication channel,Electronic engineering,Degradation (geology),Engineering,MOSFET
Conference
ISSN
ISBN
Citations 
pending E-ISBN : 978-1-4673-0144-2
978-1-4673-0144-2
0
PageRank 
References 
Authors
0.34
0
4
Name
Order
Citations
PageRank
Yasunori Mitani145.96
Fukatsu, S.200.34
Hagishima, D.300.34
Kazuya Matsuzawa473.18