Title
A robust to PVT fully-differential amplifier in 45nm SOI-CMOS technology
Abstract
In this paper the design of a robust to Process, Voltage and Temperature (PVT) variations fully-differential voltage amplifier is presented. The proposed circuit is implemented in a standard digital CMOS technology as 45 nm-1 V Silicon-on-Insulator. The robustness of the circuit is achieved through the use of a novel input stage, which combines two single-ended differential pairs to obtain a fully-differential behaviour. In addition, compound transistors are used in order to increase the output impedance of the devices and hence the gain. As a result, a low-frequency gain of 60 dB is achieved, with a maximum variation of ±4.2 dB for all process corners and temperatures between -40 °C and 120 °C, and supply voltages between 0.9 V and 1.1 V; moreover transient behaviour and PSRR present a robust performance too.
Year
DOI
Venue
2013
10.1109/LASCAS.2013.6519005
Circuits and Systems
Keywords
DocType
ISSN
cmos analogue integrated circuits,differential amplifiers,silicon-on-insulator,psrr,pvt fully-differential amplifier,pvt variations,soi-cmos technology,si,gain 60 db,low-frequency gain,output impedance,process voltage and temperature variations,size 45 nm,standard digital cmos technology,temperature 40 degc to 120 degc,voltage 0.9 v to 1.1 v,pvt robustness,voltage amplifier,fully-differential,silicon on insulator
Conference
2330-9954
ISBN
Citations 
PageRank 
978-1-4673-4897-3
0
0.34
References 
Authors
2
3
Name
Order
Citations
PageRank
Amaya, A.102.37
Villota, F.200.34
Espinosa, G.300.34