Title
Dynamical IMC-growth calculation
Abstract
Material movement between solder joints and their contact pads leads to the formation of intermetallic compounds at the contact surfaces. Concentration gradients are responsible for this material movement. The intermetallic compound growth during temperature storage and AC/DC electromigration tests on 12 x 12 mm Amkor (R) PoP with SnAg3.0Cu0.5 ball grid arrays including direct SnAgCu to Cu contacts at their bottom bumps was investigated. Based on the resulting increase in the IMC thickness the average mass flux of Cu and Sn were calculated. The activation energies (E-A) diffusion constants (D-o), effective charges (Z*) and heats of transport (Q*) are determined by measurement. With these parameters the mass fluxes due to concentration gradients, electromigration and thermomigration are calculated and the results were implemented in a routine for the dynamical calculation of the IMC-growth. Finally these calculations were validated by measurements. (C) 2015 Elsevier Ltd. All rights reserved.
Year
DOI
Venue
2015
10.1016/j.microrel.2015.06.052
MICROELECTRONICS RELIABILITY
Keywords
Field
DocType
Simulation,IMC growth,Migration,Reliability,Packaging and assembly,Package on package
Mass flux,Flux (metallurgy),Intermetallic,Electronic engineering,Soldering,Engineering,Electromigration,Package on package,Contact surfaces
Journal
Volume
Issue
ISSN
55
9-10
0026-2714
Citations 
PageRank 
References 
0
0.34
4
Authors
3
Name
Order
Citations
PageRank
Lutz Meinshausen183.47
Kirsten Weide-Zaage23114.97
Hélène Frémont32012.71