Name
Abstract | ||
|---|---|---|
The scaling limits of multi-aperture systems have been widely discussed from an information-theoretical standpoint. While these arguments are valid as an upper limit, the real-world performance of systems for mobile devices remains restricted by optical aberrations. We argue that aberrations can be more easily controlled with certain architectures of multi-aperture systems, especially those manufactured on wafer scale (wafer-level optics, WLO). We complement our analysis with measurements of one single-and one multiaperture WLO camera. We examine both sharpness and sensitivity, giving measurements of modulation transfer function and temporal noise, and showing that multi-aperture systems can indeed reduce size without compromising performance. (C) The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI. [DOI: 10.1117/1.JEI.22.1.011001] |
Year | DOI | Venue |
|---|---|---|
2013 | 10.1117/1.JEI.22.1.011001 | JOURNAL OF ELECTRONIC IMAGING |
Field | DocType | Volume |
Aperture,Computer vision,Wafer,Optical transfer function,Computer science,Mobile device,Lens (optics),Artificial intelligence,Scaling | Journal | 22 |
Issue | ISSN | Citations |
1 | 1017-9909 | 1 |
PageRank | References | Authors |
0.41 | 3 | 2 |
Name | Order | Citations | PageRank |
|---|---|---|---|
| Alexander Oberdörster | 1 | 2 | 0.76 |
| Hendrik P. A. Lensch | 2 | 1471 | 96.59 |