Name
Abstract | ||
|---|---|---|
The system control of a micro-stereolithographic fabrication system is detailed, with specific attention given to the opto-electronic and electro-mechanical interfaces. The application of the National Instrument LabVEIW© environment is demonstrated to provide a good basis for rapid application development of the necessary control structures. In particular, this provides the basis for a highly flexible control system, typical activities of which include: low-level interface formats; icon-based systems design; and support for good human–computer interfacing. The resulting system has the capability to provide two orders of magnitude improvement above that currently available. |
Year | DOI | Venue |
|---|---|---|
1998 | 10.1016/S0141-9331(98)00070-2 | Microprocessors and Microsystems |
Keywords | Field | DocType |
Rapid prototyping,Micro-stereolithography,Software systems control,Rapid applications development | Rapid prototyping,Rapid application development,Systems engineering,Stereolithography,Computer science,Systems design,Interfacing,Real-time computing,Software system,Systems development life cycle,Control system | Journal |
Volume | Issue | ISSN |
22 | 2 | 0141-9331 |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
5 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Shipping Huang | 1 | 0 | 0.34 |
| Malcolm I. Heywood | 2 | 576 | 55.94 |
| Rupert C. D. Young | 3 | 0 | 0.34 |
| Maria Farsari | 4 | 0 | 0.34 |
| Chris R. Chatwin | 5 | 0 | 0.34 |