Title
Step tunneling-enhanced hot-electron injection in vertical graphene base transistors
Abstract
This paper presents promising current-voltage characteristics of semiconductor-insulator-graphene tunnel diodes as the hot-electron injection unit in graphene base transistors (GBTs). We propose that by using a bilayer tunnel barrier one can effectively suppress the defect mediated carrier transport while enhancing the hot-electron emission through Fowler-Nordheim tunneling (FNT) and step tunneling (ST). A stack of TmSiO/TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> (1 nm/ 5.5 nm) is sandwiched between a highly doped Si substrate and a single layer graphene (SLG) as the electrodes. This tunnel diode exhibits high current with large nonlinearity suitable for the application in GBTs.
Year
DOI
Venue
2015
10.1109/ESSDERC.2015.7324749
2015 45th European Solid State Device Research Conference (ESSDERC)
Keywords
Field
DocType
graphene,hot-electron,tunneling,transistor,vertical,dielectric,bilayer
Quantum tunnelling,Graphene,Bilayer graphene,Diode,Tunnel diode,Graphene nanoribbons,Electronic engineering,Hot-carrier injection,Materials science,Bilayer
Conference
ISSN
ISBN
Citations 
1930-8876
978-1-4673-7133-9
0
PageRank 
References 
Authors
0.34
0
7
Name
Order
Citations
PageRank
Sam Vaziri101.69
M. Belete200.34
Anderson D. Smith301.35
Eugenio Dentoni Litta400.68
Grzegorz Lupina501.01
Max C. Lemme6183.57
Mikael Östling713.36