Title
A collective relaxation model for resistance drift in phase change memory cells
Abstract
Phase change memory (PCM) cells rely on the orders of magnitude difference in resistivity between the crystalline and amorphous phases to store information. However, the temporal evolution of the resistance of the amorphous phase, commonly referred to as resistance drift, is a key challenge for the realization of multi-level PCM. In this article, we present a comprehensive description of the time-temperature dependence of the resistance variation in a PCM cell. Our model consists of a structural relaxation model and an electrical transport model. The structural relaxation model is based on the idea that the atomic configuration of the melt-quenched amorphous phase as a whole collectively relaxes towards a more favorable equilibrium state. Experimental results obtained over a wide range of temperatures and times show remarkable agreement with the proposed model.
Year
DOI
Venue
2015
10.1109/IRPS.2015.7112808
IRPS
Field
DocType
ISSN
Orders of magnitude (numbers),Phase-change memory,Crystal,Electronic engineering,Annealing (metallurgy),Engineering,Temperature measurement,Electrical resistivity and conductivity,Thermodynamic equilibrium,Amorphous solid
Conference
1541-7026
Citations 
PageRank 
References 
6
0.76
2
Authors
5
Name
Order
Citations
PageRank
Sebastian, A.126744.35
Daniel Krebs260.76
Manuel Le Gallo3479.73
Haralampos Pozidis419327.36
Evangelos Eleftheriou51590118.20