Title
Beyond-Si materials and devices for more Moore and more than Moore applications
Abstract
In this work, we will review the current progress in high mobility devices and new device architectures. With main focus on (Si)Ge for pMOS and In(Ga)As for nMOS, the benefits and challenges of integrating these materials on a Si platform will be discussed. Next to that, the advantages of tunnel FETs, vertical logic and in general heterogeneous integration will be highlighted.
Year
DOI
Venue
2016
10.1109/ICICDT.2016.7542050
2016 International Conference on IC Design and Technology (ICICDT)
Keywords
Field
DocType
high mobility materials,vertical devices,tunnel FET,heterogeneous integration
NMOS logic,Mobility devices,Electronic engineering,Engineering,MOSFET,PMOS logic,Electrical engineering
Conference
ISBN
Citations 
PageRank 
978-1-5090-0321-1
0
0.34
References 
Authors
2
26
Name
Order
Citations
PageRank
Nadine Collaert173.12
A. Alian200.68
H. Arimura300.34
Geert Boccardi400.34
Geert Eneman501.01
Jacopo Franco62218.53
Tsvetan Ivanov711.16
Dennis Lin881.41
Jérôme Mitard911.79
S. Ramesh1000.68
R. Rooyackers1100.34
M. Schaekers1200.34
A. Sibaya-Hernandez1300.34
S. Sioncke1401.01
Q. Smets1500.68
Abhitosh Vais1611.83
A. Vandooren1700.68
A. Veloso1800.68
A. Verhulst1900.34
D. Verreck2000.68
N. Waldron2100.68
A. Walke2200.34
l witters2301.01
Yu HongYu2401.01
X. Zhou2501.01
Aaron Voon-Yew Thean2600.34