Name
Abstract | ||
|---|---|---|
Hybrid optical proximity correction (OPC) processing approach based on clustering algorithm is proposed, where the localized structuresu0027 complexity will drive their respective methodology of OPC, either rule-based (RB) OPC or model-based (MB) OPC. The proposed approach also flags the lithography hotspots from the input design for custom OPC treatments. The effectiveness of the proposed method is verified by simulating few critical layers in advanced technology nodes. Compared to MBOPC approach, the proposed method reduces the overall simulation time by a significant amount, without compromising the desired accuracy limits. |
Year | Venue | Field |
|---|---|---|
2017 | VLSI Design | Algorithm design,Optical proximity correction,Computer science,Resist,Electronic engineering,Lithography,Input design,Cluster analysis,Optical imaging,Adaptive optics |
DocType | Citations | PageRank |
Conference | 0 | 0.34 |
References | Authors | |
0 | 5 | |
Name | Order | Citations | PageRank |
|---|---|---|---|
| Pardeep Kumar | 1 | 243 | 24.38 |
| S. Srivatsa | 2 | 0 | 0.34 |
| P. Mantripragada | 3 | 0 | 0.34 |
| S. Upreti | 4 | 0 | 0.68 |
| K. V. Shravya | 5 | 0 | 0.34 |