Paper Info
Title
An Effective Layout Decomposition Method for DSA with Multiple Patterning in Contact-Hole Generation.
Abstract
Directed self-assembly (DSA) complemented with multiple patterning (MP) is an attractive next generation lithography (NGL) technique for contact-hole generation. Nevertheless, a high-quality DSA-aware layout decomposer is required to enable the technology. In this article, we introduce an efficient method which incorporates a set packing for generating DSA template candidates and a local search method. Besides, a multi-start strategy is integrated into the framework to prevent the local minima. Our framework encourages the reuse of existing coloring solvers. Hence, the development cost can significantly be reduced. In addition, for DSA multiple patterning where the number of masks is larger than two, we present an efficient iterative partition based method. Experimental results show that compared with the state-of-the-art work, our methods can achieve roughly 100× speedup for double patterning, and 78.8% conflict reduction with 5× speedup for triple patterning on the dense graphs.
Year
DOI
Venue
2017
10.1145/3131847
ACM Trans. Design Autom. Electr. Syst.
Keywords
Field
DocType
Design for manufacturability, directed self-assembly, iterative partition, multiple patterning, multiple start points, set packing
Computer science,Parallel computing,Decomposition method (constraint satisfaction),Multiple patterning,Computational science,Directed self assembly,Set packing,Next-generation lithography,Design for manufacturability,Contact hole
Journal
Volume
Issue
ISSN
23
1
1084-4309
Citations 
PageRank 
References 
1
0.40
24
Authors
7
Name
Order
Citations
PageRank
Yunfeng Yang141.14
Wai-Shing Luk218715.13
Hai Zhou343742.37
David Z. Pan42653237.64
Dian Zhou526056.14
Changhao Yan66811.28
Xuan Zeng740875.96