Name
Abstract | ||
|---|---|---|
Laser scanning lithography is a maskless method for exposing photoresist during semiconductor manufacturing. In this method, the power of a focused beam is modulated while scanning the photoresist. This article describes an iterative de convolution method for determining the exposure pattern. This approach is computationally efficient as there is no gradient calculation. Simulations demonstrate the accurate fabrication of a feature with sub-wavelength geometry. |
Year | Venue | Field |
|---|---|---|
2018 | 2018 ANNUAL AMERICAN CONTROL CONFERENCE (ACC) | Maskless lithography,Laser scanning,Iterative method,Control theory,Computer science,Semiconductor device fabrication,Deconvolution,Optics,Resist,Lithography,Photoresist |
DocType | ISSN | Citations |
Conference | 0743-1619 | 0 |
PageRank | References | Authors |
0.34 | 0 | 4 |
Name | Order | Citations | PageRank |
|---|---|---|---|
| Omid T. Ghalehbeygi | 1 | 0 | 1.01 |
| John O'Connor | 2 | 0 | 0.34 |
| Ben S. Routley | 3 | 0 | 0.68 |
| A. J. Fleming | 4 | 9 | 4.75 |