Title
45nm Bit-Interleaving Differential 10T Low Leakage FinFET Based SRAM with Column-Wise Write Access Control
Abstract
On-chip SRAM array occupies a large area in the microprocessor ICs. This enforces the technology to reach nano-scale domain. In this domain, minimizing the short channel effects, leakage current and improving reliability of memory cell are significant and challenging. FinFET device reduces the short channel effects, leakage current and enhances the performance of the SRAM cell at 45nm technology node and beyond. This paper presents supply voltage management technique for designing a low-power and variability-aware SRAM cell. In this paper, we propose a FinFET based differential 10T SRAM cell using Drowsy Cache architecture for leakage power reduction at 45nm technology node. The proposed differential 10 T SRAM permits bit interleaving with column-wise write access control, having differential read path, thus, improving reliability of the SRAM cell. The proposed circuit also restricts pseudoread problem, by allowing column-wise write in SRAM cell array. The simulation has been carried out on Cadence Virtuoso at 45nm technology node.
Year
DOI
Venue
2018
10.1109/DFT.2018.8602981
2018 IEEE International Symposium on Defect and Fault Tolerance in VLSI and Nanotechnology Systems (DFT)
Keywords
Field
DocType
Differential 10T SRAM,Bit-interleaving,Pseudoread,Drowsy Cache Technique,Static Power Dissipation
Leakage (electronics),Computer science,Voltage,Microprocessor,Cache-only memory architecture,Communication channel,Static random-access memory,Electronic engineering,Interleaving,Memory cell
Conference
ISSN
ISBN
Citations 
1550-5774
978-1-5386-8399-6
0
PageRank 
References 
Authors
0.34
10
4
Name
Order
Citations
PageRank
Vishal Gupta184.94
Saurabh Khandelwal200.68
Jimson Mathew323055.44
Marco Ottavi416124.21