Paper Info
Title
Physical Vapor Deposition Technique And Its Application To Thin Organometallic Films
Abstract
This work contains description of the Physical Vapor Deposition technique and its application to selected organometallic thin films deposition process. We investigation results of the structural and optical properties of the thin films containing metal (M = Zn, Cu and Al) and bis-or tris(8-hydroxyquinoline). The films were successfully grown by physical vapor deposition (PVD) technique in high vacuum on transparent (quartz) and semiconductor (n-type silicon) substrates kept at room temperature during the deposition process. Selected films were annealed after fabrication in ambient atmosphere for 24 hours at the temperature equal to 50 degrees C, 100 degrees C and 150 degrees C. Spectral properties of these films were examined using classical and time-dependent photoluminescence investigations. Nonlinear optical effects were studied using Third Harmonic Generation and Z-Scan techniques.Structural properties were investigated by optical images and AFM measurements. The Mq(n) (n = 2 or 3) films exhibit high structural quality regardless of the annealing process, but the stability of the film can be improved by using an appropriate temperature during the annealing process. We find that the optical properties were strictly connected with the morphology and the temperature of annealing process can change the structural as well as optical properties of the films.
Year
DOI
Venue
2017
10.1109/ICTON.2017.8024901
2017 19TH INTERNATIONAL CONFERENCE ON TRANSPARENT OPTICAL NETWORKS (ICTON)
Keywords
DocType
ISSN
physical vapor deposition, 8-hydroxyquinoline compounds, photoluminescence, third harmonic generation, Z-scan
Conference
2162-7339
Citations 
PageRank 
References 
0
0.34
0
Authors
8
Name
Order
Citations
PageRank
Zawadzka, A.104.39
Plociennik, P.201.69
K. Waszkowska300.68
Z. Masewicz400.34
A. Aamoum500.34
J. Strzelecki600.68
andrzej korcala702.37
B. Sahraoui805.07