Name
Abstract | ||
|---|---|---|
The influences of compliance current (CC) introduced by transistor during the forming, set and reset operations on hafnium oxide based RRAM devices are investigated respectively. Experimental results show that CC during forming operation is more critical to RRAM performances than that in set/reset operations, indicating that the suppression of current overshoot issue is more important during forming process. The impacts of CC on oxygen ions immigration during resistive switching can be responsible for the different influences on devices in set/reset and forming operation. |
Year | DOI | Venue |
|---|---|---|
2015 | 10.1109/NVMTS.2015.7457474 | 2015 15th Non-Volatile Memory Technology Symposium (NVMTS) |
Keywords | Field | DocType |
compliance current,RRAM,current overshooting | Hafnium oxide,Resistive switching,Forming processes,Overshoot (signal),Electronic engineering,Transistor,Materials science,Resistive random-access memory | Conference |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
6 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Yichen Fang | 1 | 0 | 2.03 |
| Yimao Cai | 2 | 9 | 7.26 |
| Zongwei Wang | 3 | 1 | 2.46 |
| Zhizhen Yu | 4 | 0 | 2.03 |
| Xue Yang | 5 | 15 | 10.21 |
| Ru Huang | 6 | 188 | 48.74 |