Name
Title | ||
|---|---|---|
Ultra-low Loss Arrayed Waveguide Grating Using Deep UV Lithography on a Generic InP Photonic Integration Platform |
Abstract | ||
|---|---|---|
ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm. |
Year | DOI | Venue |
|---|---|---|
2017 | 10.1109/ECOC.2017.8345906 | 2017 European Conference on Optical Communication (ECOC) |
Keywords | DocType | ISBN |
generic InP photonic integration platform,ArF deep UV lithography,generic Indium Phosphide technology,ultralow loss arrayed waveguide grating,Deep UV Lithography,subdB transmission losses,size 100.0 nm,wavelength 193.0 nm,InP | Conference | 978-1-5386-4993-0 |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
11 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Jeroen Bolk | 1 | 0 | 0.34 |
| H.P.M.M. Ambrosius | 2 | 0 | 0.68 |
| p dasmahapatra | 3 | 0 | 0.68 |
| Patty Stabile | 4 | 0 | 0.34 |
| sylwester latkowski | 5 | 0 | 3.04 |
| D'Agostino, D. | 6 | 0 | 0.68 |
| E Elton Bitincka | 7 | 0 | 0.34 |
| Lm Luc Augustin | 8 | 0 | 0.34 |
| Didier Marsan | 9 | 0 | 0.34 |
| Rutger Voets | 10 | 0 | 0.34 |
| Ka Kevin Williams | 11 | 2 | 0.71 |