Name
Abstract | ||
|---|---|---|
This paper presents a strategy of fabricating v-shaped nano-slit arrays in silicon substrates at wafer scale, by using a three-step wet anisotropic etching method, with the combination of a color-feedback mechanism. Through careful mask design, nano-slits with various aspect ratios and sizes were obtained. The minimum feature size of the obtained nano-slits was 6 nm, which holds great potential in biomolecule analyses such as DNA and protein detection. The size uniformity of the nano-slit array was carefully analyzed, and solutions to improve the size uniformity were proposed. |
Year | DOI | Venue |
|---|---|---|
2018 | 10.1109/NEMS.2018.8557025 | NEMS |
DocType | Citations | PageRank |
Conference | 0 | 0.34 |
References | Authors | |
0 | 4 | |
Name | Order | Citations | PageRank |
|---|---|---|---|
| Qi Chen | 1 | 0 | 0.68 |
| Yifan Wang | 2 | 0 | 0.68 |
| Hualv Zhang | 3 | 0 | 0.34 |
| Zewen Liu | 4 | 2 | 5.78 |