Name
Title | ||
|---|---|---|
Compensating Misalignment Using Dynamic Random-Effect Control System: A Case of High-Mixed Wafer Fabrication |
Abstract | ||
|---|---|---|
It is vital to have an exclusive modification in semiconductor production process because of meeting differentiated customer demands in dynamic and competitive global minuscule semiconductor technology market and the highly complex fabrication process. In this paper, we propose a control system based on the dynamic mixed-effect least-square support vector regression (LS-SVR) control system for ove... |
Year | DOI | Venue |
|---|---|---|
2019 | 10.1109/TASE.2019.2894668 | IEEE Transactions on Automation Science and Engineering |
Keywords | Field | DocType |
Process control,Control systems,Metrology,Delays,MISO communication,Lithography,Support vector machines,Intelligent manufacturing systems | Control theory,Computer science,Metrology,Wafer fabrication,Semiconductor device fabrication,EWMA chart,Scheduling (production processes),Control engineering,Process control,Control system | Journal |
Volume | Issue | ISSN |
16 | 4 | 1545-5955 |
Citations | PageRank | References |
1 | 0.34 | 0 |
Authors | ||
3 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Marzieh Khakifirooz | 1 | 3 | 3.39 |
| Chen-Fu Chien | 2 | 13 | 4.47 |
| Mahdi Fathi | 3 | 2 | 4.07 |